The micro and nanofabrication service (MiNa) of the Instituto de Micro y Nanotecnología (IMN) was set up when the High Resolution Lithography Laboratory (LAB-LAR) joined the Fabrication Facility equipment of the IMN. The LAB-LAR belongs to the Network of Laboratories and Research Infrastructures of the Community of Madrid. It holds Quality Certification ISO 9001, working with great efficiency to meet the growing demand for manufacturing structures for research groups outside the IMN. It has two main features.
First, it offers a flexible service by adapting the technology to the client’s requirements as much as possible. This ranges from basic, single-step to multi-step processes that allow the possibility of manufacturing complex structures without the restrictions imposed by a standard clean room. Second, its pioneering role in the development of nanotechnology in Spain allows it to offer technological processes beyond current conventional standards. Furthermore, it is one of the few services who offer high-resolution electron beam lithography, and the only one in Spain to offer ultra high resolution ion beam fabrication on large areas.
The service completes its objectives when it transfers its experience
s to the rest of the Spanish scientific community by offering its knowledge and high-level infrastructures to R&D centres and technological companies.
Instituto de Micro y Nanotecnología (Centro Nacional de Microelectrónica)
PTM, calle Isaac Newton 8, 28760 Tres Cantos, Madrid
Tel. +34 91 806 07 85
Fax. +34 91 806 07 01
Dr. Maria Luisa Dotor Castilla