Local Oxidation Nanolithography has become the most popular and extensively used scanning probe-based lithographic method. In the past few years the strong activity devoted to this method has revealed some of the relevant factors affecting the local oxidation growth such as the voltage and pulse duration, doping of the substrate, space charge buildup or the formation of a liquid bridge. Simultaneously, a large variety of nanometer-scale and mesoscopic devices such as metallic and single electron transistors, high density memories, quantum dots or superconducting interference devices have been fabricated. However, Local Oxidation Nanolithography have not yet established itself as an alternative lithographic method, so we must coordinate our efforts to overcome the current limitations. The workshop will provide a unique opportunity to capture the state of the art and the challenges faced by Local Oxidation Nanolithography as well as to provide a sense of community to its practitioners. Special attention will be paid to the following three core areas, physics of local oxidation by AFM - SPM, niche applications and new devices.